High Frequency Electrical Characterization of 3D Signal/Ground through
Silicon Vias
Steve Adamshick
,
Robert Carroll
,
Megha Rao
,
Douglas La Tuplie
,
Seth Kruger
,
John Burke
and
Michael Liehr
3D integration using through-silicon-vias (TSVs) is gaining considerable attention due to its superior packaging efficiency resulting in higher functionality, improved performance and a reduction in power consumption. In order to implement 3D chip designs with TSV technology, robust TSV electrical models are required. Specifically, due to the increase of signal speeds into the gigahertz (GHz) spectrum, a high frequency electrical characterization best describes TSV behavior. In this letter, 5x50 μm TSVs are manufactured using a via-mid integration scheme and characterized using S-Parameters up to 65 GHz. At 50 GHz, the measured attenuation constant is 0.35 dB/via with a time delay of 0.7 ps/via.