1. Yang, J. J., D. B. Strukov, and D. R. Stewart, "Memristive devices for computing," Nature Nanotech., Vol. 8, No. 1, 13-24, 2013.
doi:10.1038/nnano.2012.240

2. Wong, H.-S. P. and S. Salahuddin, "Memory leads the way to better computing," Nature Nanotech., Vol. 10, No. 3, 191-195, 2015.
doi:10.1038/nnano.2015.29

3. Fong, S. W., C. M. Neumann, and H.-S. P. Wong, "Phase-change memory towards a storage-class memory," IEEE Trans. Electron Devices, Vol. 64, No. 11, 4374-4385, 2017.
doi:10.1109/TED.2017.2746342

4. Yu, S. M., X. M. Guan, and H. S. P. Wong, "On the stochastic nature of resistive switching in metal oxide RRAM: Physical modeling, monte carlo simulation, and experimental characterization," 2011 IEEE International Electron Devices Meeting (IEDM), 2011.

5. Wang, X. F., H. M. Zhao, Y. Yang, and T. L. Ren, "Graphene resistive random memory - The promising memory device in next generation," Chinese Physics B, Vol. 26, No. 3, 038501, 2017.
doi:10.1088/1674-1056/26/3/038501

6. Paolo, L., R. Rosario, and I. Fernanda, "Forming kinetics in HfO₂-based RRAM cells," IEEE Trans. Electron Devices, Vol. 60, No. 1, 438-443, 2013.
doi:10.1109/TED.2012.2227324

7. Kim, S. and Y. K. Choi, "A comprehensive study of the resistive switching mechanism in Al/TiOx/TiO₂/Al-structured RRAM," IEEE Trans. Electron Devices, Vol. 56, No. 12, 3049-3054, 2009.
doi:10.1109/TED.2009.2032597

8. Kumar, D., U. Chand, L. W. Siang, and T. Y. Tseng, "High-performance TiN/Al₂O₃/ZnO/Al₂O₃/TiN flexible RRAM device with high bending condition," IEEE Trans. Electron Devices, Vol. 67, No. 2, 493-498, 2020.
doi:10.1109/TED.2019.2959883

9. Chien, W. C., Y. C. Chen, E. K. Lai, Y. D. Yao, P. Lin, S. F. Horng, J. Gong, T. H. Chou, H. M. Lin, M. N. Chang, Y. H. Shih, K. Y. Hsieh, R. Liu, and C.-Y. Lu, "Unipolar switching behaviors of RTO WOX RRAM," IEEE Electron Devices Letters, Vol. 31, No. 2, 126-128, 2010.
doi:10.1109/LED.2009.2037593

10. Sung, C., et al. "Investigation of I-V linearity in TaOx-based RRAM devices for neuromorphic applications," IEEE Journal of The Electron Devices Society, Vol. 7, No. 1, 404-408, 2019.
doi:10.1109/JEDS.2019.2902653

11. Xie, H. W., Y. T. Liu, and Z. X. Huang, "A NiOx, based threshold switching selector for RRAM crossbar array application," 2019 IEEE International Conference on Electron Devices and Solid-State Circuits (EDSSC), 2019.

12. Woo, J., et al. "Improved synaptic behavior under identical pulses using AlOx/HfO₂ bilayer RRAM array for neuromorphic systems," IEEE Electron Devices Letters, Vol. 37, No. 8, 994-997, 2016.
doi:10.1109/LED.2016.2582859

13. Wedig, A., M. Luebben, D.-Y. Cho, M. Moors, K. Skaja, V. Rana, T. Hasegawa, K. K. Adepalli, B. Yildiz, R. Waser, and I. Valov, "Nanoscale cation motion in TaOx, HfOx and TiOx," Nature Nanotech., Vol. 11, No. 1, 67-75, 2016.
doi:10.1038/nnano.2015.221

14. Lu, N. D., P. X. Sun, L. Li, Q. Liu, S. B. Long, H. B. Lv, and M. Liu, "Thermal effect on endurance performance of 3-dimensional RRAM crossbar array," Chinese Physics B, Vol. 25, No. 5, 1-5, 2016.

15. Sohn, J., S. Lee, Z. Jiang, H. Y. Chen, and H. S. P. Wong, "Atomically thin graphene plane electrode for 3D RRAM," 2014 IEEE International Electron Devices Meeting (IEDM), 2014.

16. Yu, S., H. Y. Chen, B. Gao, J. Kang, and H. S. P. Wong, "HfOx-based vertical resistive switching random access memory suitable for bit-cost-effective three-dimensional cross-point architecture," ACS Nano, Vol. 7, No. 3, 2320-2325, 2013.
doi:10.1021/nn305510u

17. Ji, Y., S. Lee, B. Cho, S. Song, and T. Lee, "Flexible organic memory devices with multilayer graphene electrodes," ACS Nano, Vol. 5, No. 7, 5995-6000, 2011.
doi:10.1021/nn201770s

18. Wang, C. H., et al. "3D monolithic stacked 1T1R cells using monolayer MoS₂ FET and hBN RRAM fabricated at low (150 degrees C) temperature," 2018 IEEE International Electron Devices Meeting (IEDM), 2018.

19. Pan, C. B., et al. "Coexistence of grain-boundaries-assisted bipolar and threshold resistive switching in multilayer hexagonal boron nitride," Adv. Funct. Mater., Vol. 27, No. 10, 1604811, 2017.
doi:10.1002/adfm.201604811

20. Zhuang, P. P., et al. "Nonpolar resistive switching of multilayer-hBN-based memories," Adv. Electron. Mater., Vol. 6, No. 1, 1900979, 2020.
doi:10.1002/aelm.201900979

21. Ranjan, A., N. Raghavan, S. J. O'Shea, S. Mei, M. Bosman, K. Shubhakar, and K. L. Pey, "Conductive atomic force microscope study of bipolar and threshold resistive switching in 2D hexagonal boron nitride films," Scientific Reports, Vol. 8, 2854, 2018.
doi:10.1038/s41598-018-21138-x

22. Wu, X. H., et al. "Thinnest nonvolatile memory based on monolayer h-BN," Adv. Mater., Vol. 31, No. 15, 1806790, 2019.
doi:10.1002/adma.201806790

23. Zhu, K. C., et al. "Graphene-boron nitride-graphene cross-point memristors with three stable resistive states," ACS Applied Materials & Interfaces, Vol. 11, No. 41, 37999-38005, 2019.
doi:10.1021/acsami.9b04412

24. Zhuang, P. P., W. Z. Ma, J. Liu, W. W. Cai, and W. Y. Lin, "Progressive RESET induced by Joule heating in hBN RRAMs," Appl. Phys. Lett., Vol. 118, No. 14, 143101, 2021.
doi:10.1063/5.0040902

25. Lin, W. Y., P. P. Zhuang, D. Akinwande, X. A. Zhang, and W. W. Cai, "Oxygen-assisted synthesis of hBN films for resistive random access memories," Applied Phys. Letters, Vol. 115, No. 7, 073101, 2019.
doi:10.1063/1.5100495

26. Palumbo, F., et al. "Bimodal dielectric breakdown in electronic devices using chemical vapor deposited hexagonal boron nitride as dielectric," Advanced Electronic Materials, Vol. 4, No. 3, 1700506, 2018.
doi:10.1002/aelm.201700506

27. Jiang, J. K., K. Parto, W. Cao, and K. Banerjee, "Ultimate monolithic-3D integration with 2D materials: Rationale, prospects, and challenges," IEEE Journal of The Electron Devices Society, Vol. 7, No. 1, 878-887, 2019.
doi:10.1109/JEDS.2019.2925150

28. Tian, H., H. Y. Chen, B. Gao, S. Yu, J. Liang, Y. Yang, D. Xie, J. Kang, T. L. Ren, Y. Zhang, and W. H. S. Philip, "Monitoring oxygen movement by raman spectroscopy of resistive random access memory with a graphene-inserted electrode," NANO Letters, Vol. 13, 651-657, 2013.
doi:10.1021/nl304246d

29. Lee, K., et al. "Enhancement of resistive switching under confined current path distribution enabled by insertion of atomically thin defective monolayer graphene," Sci. Rep., Vol. 5, 11279, 2015.
doi:10.1038/srep11279

30. Lee, S., J. Sohn, Z. Z. Jiang, H. Y. Chen, and H.-S. P. Wong, "Metal oxide-resistive memory using graphene-edge electrodes," Nature Commu., Vol. 6, 8407, 2015.
doi:10.1038/ncomms9407

31. Lee, J., C. Du, K. Sun, E. Kioupakis, and W. D. Lu, "Tuning ionic transport in memristive devices by graphene with engineered nanopores," ACS Nano, Vol. 10, No. 3, 3571-3579, 2016.
doi:10.1021/acsnano.5b07943

32. Xie, H., W. C. Chen, S. Zhang, G. D. Zhu, A. Khaliq, J. Hu, and W. Y. Yin, "Modeling and simulation of resistive random access memory with graphene electrode," IEEE Trans. Electron Devices, Vol. 67, No. 3, 915-921, 2020.
doi:10.1109/TED.2020.2965182

33. Alimkhanuly, B., S. Kim, L. W. Kin, and S. Lee, "Electromagnetic analysis of vertical resistive memory with a sub-nm thick electrode," Nanomaterials, Vol. 10, No. 9, 1634, 2020.
doi:10.3390/nano10091634

34. Dean, C. R., A. F. Young, I. Meric, C. Lee, L. Wang, S. Sorgenfrei, K. Watanabe, T. Taniguchi, P. Kim, K. L. Shepard, and J. Hone, "Boron nitride substrates for high-quality graphene electronics," Nat. Nanotechnol., Vol. 5, No. 10, 722-726, 2010.
doi:10.1038/nnano.2010.172

35. Giovannetti, G., P. A. Khomyakov, G. Brocks, P. J. Kelly, and J. van den Brink, "Substrate-induced band gap in graphene on hexagonal boron nitride:Ab initio density functional calculations," Phys. Rev. B, Vol. 76, No. 7, 073103, 2007.
doi:10.1103/PhysRevB.76.073103

36. Weng, Q. H., X. B. Wang, X. Wang, Y. Bando, and D. Golberg, "Functionalized hexagonal boron nitride nanomaterials: Emerging properties and applications," Chem. Soc. Rev., Vol. 45, No. 12, 3989-4012, 2016.
doi:10.1039/C5CS00869G

37. Lee, J., T. J. Ha, K. N. Parrish, S. F. Chowdhury, L. Tao, A. Dodabalapur, and D. Akinwande, "High-performance current saturating graphene field-effect transistor with hexagonal boron nitride dielectric on flexible polymeric substrates," IEEE Electron Device Lett., Vol. 34, No. 2, 172-174, 2013.
doi:10.1109/LED.2012.2233707

38. Jiang, Y., X. Lin, and H. Chen, "Directional polaritonic excitation of circular, huygens and Janus dipoles in graphene-hexagonal boron nitride heterostructures," Progress In Electromagnetics Research, Vol. 170, 169-176, 2021.
doi:10.2528/PIER21050101

39. Shi, Y., C. Pan, V. Chen, N. Raghavan, K. L. Pey, F. M. Puglisi, E. Pop, H. S. P. Wong, and M. Lanza, "Coexistence of volatile and non-volatile resistive switching in 2D h-BN based electronic synapses," 2017 IEEE International Electron Devices Meeting (IEDM), 2017.

40. Tsai, T. M., et al. "Controlling the degree of forming soft-breakdown and producing superior endurance performance by inserting BN-based layers in resistive random access memory," IEEE Electron Devices Letters, Vol. 38, No. 4, 445-448, 2017.
doi:10.1109/LED.2017.2664881

41. Zhang, D. J., C. H. Yeh, W. Cao, and K. Banerjee, "0.5T0.5R - An ultracompact RRAM cell uniquely enabled by van derWaals heterostructures," IEEE Trans. Electron Devices, Vol. 68, No. 4, 2033-2040, 2021.
doi:10.1109/TED.2021.3057598

42. Jeong, H., et al. "Resistive switching in few-layer hexagonal boron nitride mediated by defects and interfacial charge transfer," ACS Applied Materials & Interfaces, Vol. 12, No. 41, 46288-46295, 2020.
doi:10.1021/acsami.0c12012

43. Tan, C. L. and H. Zhang, "Two-dimensional transition metal dichalcogenide nanosheet-based composites," Chem. Soc. Rev., Vol. 44, No. 9, 2713-2731, 2015.
doi:10.1039/C4CS00182F

44. Rehman, M. M., H. M. N. U. Rehman, J. Z. Gul, W. Y. Kim, K. S. Karimov, and N. Ahmed, "Decade of 2D-materials-based RRAM devices: A review," Science and Technology of Advanced Materials, Vol. 21, No. 1, 147-186, 2020.
doi:10.1080/14686996.2020.1730236

45. Chiang, C. C., V. Ostwal, P. Wu, C. S. Pang, F. Zhang, Z. H. Chen, and J. Appenzeller, "Memory applications from 2D materials," Applied Physics Reviews, Vol. 8, No. 2, 021306, 2021.
doi:10.1063/5.0038013

46. Huang, Y. J. and S. C. Lee, "Graphene/h-BN heterostructures for vertical architecture of rram design," Scientific Reports, Vol. 7, 9679, 2017.
doi:10.1038/s41598-017-08939-2

47. Pan, C. B., et al. "Model for multi-filamentary conduction in graphene/hexagonal-boron-filamentary conduction in graphene/hexagonal-boron-nitride/graphene based resistive switching devices," 2D Materials, Vol. 4, No. 2, 025099, 2017.
doi:10.1088/2053-1583/aa7129

48. Zhang, H. H., P. P. Wang, S. Zhang, L. Li, P. Li, W. E. I. Sha, and L. J. Jiang, "Electromagnetic-circuital-thermal multiphysics simulation method: A review," Progress In Electromagnetics Research, Vol. 169, 87-101, 2020.
doi:10.2528/PIER20112801

49. Duan, H., W. Fang, W.-Y. Yin, E. Li, and W. Chen, "Computational investigation of nanoscale semiconductor devices and optoelectronic devices from the electromagnetics and quantum perspectives by the finite difference time domain method," Progress In Electromagnetics Research, Vol. 170, 63-78, 2021.
doi:10.2528/PIER20122201

50. Seo, S., J. Lim, S. Lee, B. Alimkhanuly, A. Kadyrov, D. Jeon, and S. Lee, "Graphene-edge electrode on a Cu-based chalcogenide selector for 3D vertical memristor cells," ACS Appl. Mater. Interfaces, Vol. 11, No. 46, 43466-43472, 2019.
doi:10.1021/acsami.9b11721

51. Bai, Y., H. Wu, K. Wang, R. Wu, L. Song, T. Li, J. Wang, Z. Yu, and H. Qian, "Stacked 3D RRAM array with graphene/CNT as edge electrodes," Sci. Rep., Vol. 5, 13785, 2015.
doi:10.1038/srep13785

52. Mannequi, C., A. Delamoreanu, L. Latu-Romain, V. Jousseaume, H. Grampeix, S. David, C. Rabot, A. Zenasni, C. Vallee, and P. Gonona, "Graphene-HfO₂-based resistive RAM memories," Microelectronic Engineering, Vol. 161, 82-86, 2016.
doi:10.1016/j.mee.2016.04.009

53. Zhao, H., H. Tu, F. Wei, and J. Du, "Highly transparent dysprosium oxide-based RRAM with multilayer graphene electrode for low-power nonvolatile memory application," IEEE Trans. Electron Dev., Vol. 61, No. 5, 1388-1393, 2014.
doi:10.1109/TED.2014.2312611

54. Yao, J., J. Lin, Y. Dai, G. Ruan, Z. Yan, L. Li, L. Zhong, D. Natelson, and J. M. Tour, "Highly transparent nonvolatile resistive memory devices from silicon oxide and graphene," Nature Commu., Vol. 3, 1101, 2012.
doi:10.1038/ncomms2110

55. Yang, K., W. Y. Chang, P. Y. Teng, S. F. Jeng, S. J. Lin, P. W. Chiu, and J. H. He, "Fully transparent resistive memory employing graphene electrodes for eliminating undesired surface effects," Proc. IEEE, Vol. 101, No. 7, 1732-1739, 2013.
doi:10.1109/JPROC.2013.2260112

56. Hui, F., E. Grustan-Gutierrez, S. Long, Q. Liu, A. K. Ott, A. C. Ferrari, and M. Lanza, "Graphene and related materials for resistive random access memories," Adv. Electron. Mater., Vol. 3, No. 8, 600195, 2017.

57. Liu, Y., S. B. Long, Q. Liu, H. B. Lv, and M. Liu, "Resistive switching performance improvement via modulating nanoscale conductive filament, involving the application of two-dimensional layered materials," Small, Vol. 13, No. 35, 1604306, 2017.
doi:10.1002/smll.201604306

58. Kim, J., D. Kim, Y. Jo, J. Han, H. Woo, H. Kim, K. K. Kim, J. P. Hong, and H. Im, "Impact of graphene and single-layer BN insertion on bipolar resistive switching characteristics in tungsten oxide resistive memory," Thin Solid Films, Vol. 589, 188-193, 2015.
doi:10.1016/j.tsf.2015.05.002

59. Qian, M., Y. Pan, F. Liu, M. Wang, H. Shen, D. He, B. Wang, Y. Shi, F. Miao, and X. Wang, "Tunable, ultralow-power switching in memristive devices enabled by a heterogeneous graphene-oxide interface," Adv. Mater, Vol. 26, No. 20, 3275-3281, 2014.
doi:10.1002/adma.201306028

60. Jung, I., D. A. Dikin, R. D. Piner, and R. S. Rouff, "Tunable electrical conductivity of individual graphene oxide sheets reduced at ``low'' temperatures," Nano Letters, Vol. 8, No. 12, 4283-4287, 2008.
doi:10.1021/nl8019938

61. Pan, F., S. Gao, C. Chen, C. Song, and F. Zeng, "Recent progress in resistive random access memories: Materials, switching mechanisms, and performance," Materials Science & Engineering R-Reports, Vol. 83, 1-59, 2014.
doi:10.1016/j.mser.2014.06.002

62. Chen, X., et al. "Controlled nonvolatile transition in polyoxometalates-graphene oxide hybrid memristive devices," Adv. Mater. Technol., Vol. 4, No. 3, 1800551, 2019.
doi:10.1002/admt.201800551

63. Chen, C., C. Song, J. Yang, F. Zeng, and F. Pan, "Oxygen migration induced resistive switching effect and its thermal stability in W/TaOx/Pt structure," Appl. Phys. Lett., Vol. 100, No. 25, 253509, 2012.
doi:10.1063/1.4730601

64. Chen, H. Y., et al. "Experimental study of plane electrode thickness scaling for 3D vertical resistive random access memory," Nanotechnology, Vol. 24, No. 46, 465201, 2013.
doi:10.1088/0957-4484/24/46/465201

65. Li, S., W. Chen, Y. Luo, J. Hu, P. Gao, J. Ye, K. Kang, H. Chen, E. Li, and W. Y. Yin, "Fully coupled multiphysics simulation of crosstalk effect in bipolar resistive random access memory," IEEE Trans. Electron Devices, Vol. 9, No. 64, 3647-3653, 2017.
doi:10.1109/TED.2017.2730857

66. Wan, S. and Q. Cheng, "Role of interface interactions in the construction of GO-based artificial nacres," Adv. Materials Interfaces, Vol. 5, No. 12, 1800107, 2018.
doi:10.1002/admi.201800107

67. Punckt, C., F. Muckel, S. Wolff, I. A. Aksay, C. A. Chavarin, G. Bacher, and W. Mertin, "The effect of degree of reduction on the electrical properties of functionalized graphene sheets," Appl. Phys. Lett., Vol. 102, No. 2, 023114, 2013.
doi:10.1063/1.4775582