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PIER PIER B PIER C PIER M PIER Letters
2012-01-06
Planar Grating Multiplexers Using Silicon Nanowire Technology: Numerical Simulations and Fabrications
By
Jun Song,

    Dr. Jun Song

    Institute of Optoelectronics

    Shenzhen University

    China

    Homepage

Yuanzhou Li,

    Dr. Yuanzhou Li

    Shenzhen University

    China

    Homepage

Xiang Zhou,

    Dr. Xiang Zhou

    Shenzhen University

    China

    Homepage

Xuan Li

    Dr. Xuan Li

    Department of Physics and Institute of Condensed Matter Physics

    Hangzhou Normal University

    China

    Homepage

Progress In Electromagnetics Research, Vol. 123, 509-526, 2012
doi:10.2528/PIER11110402
Abstract
Planar waveguide gratings have shown great potential for the application of the wavelength division multiplexing (WDM) functionality in optical communications due to their compactness and high spectral finesse. Planar gratings based on silicon nanowire technology have high light confinements and consequently very high integration density, which is 1--2 orders of magnitude smaller than conventional silica based devices. In the present paper, we will simulate the silicon nanowire based planar grating multiplexer with total-internal-reflection facets using a boundary integral method. The polarization dependent characteristics of the device are analyzed. In addition, the planar grating multiplexer with 1 nm spacing is fabricated and characterized. Compared with measured values, the numerical results show that the sidewall roughness in the grating facets can result in a large insertion loss for the device.
Citation
Jun Song, Yuanzhou Li, Xiang Zhou, and Xuan Li, "Planar Grating Multiplexers Using Silicon Nanowire Technology: Numerical Simulations and Fabrications," Progress In Electromagnetics Research, Vol. 123, 509-526, 2012.
doi:10.2528/PIER11110402
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