1. Ho, Y. L. and K. S. Wong, "Bandwidth enhancement in silicon metal-semiconductor-metal photodetector by trench formation," IEEE Photon. Technol. Lett., Vol. 8, 1064-1066, 1996.
doi:10.1109/68.508739
2. Liu, M. Y., E. Chen, and S. Y. Chou, "140-GHz metalsemiconductor- metal photodetectors on silicon-on-insulator substrate with a scaled active layer," Appl. Phys. Lett., Vol. 65, 887-888, 1994.
doi:10.1063/1.112190
3. Mott, N. F. and E. A. Davis, Electronic Processes in Noncrystalline Materials, 2nd ed., 1979.
4. Sharma, A. K., S. H. Zaidi, P. C. Logofatu, and S. R. J. Brueck, "Optical and electrical proprties of nanostructured metalsemiconductor- metal photo detectors," IEEE Journal of Quantum Electron., Vol. 38, 1651-1660, 2002.
doi:10.1109/JQE.2002.805112
5. Kranthi, N. S., M. O. Nizam, P. Kirawanich, N. E. Islam, A. K. Sharma, and S. L. Lucero, "Fields analysis of enhanced charge collection in nanoscale grated photo detectors," Appl. Phys. Lett., Vol. 87, 244101, 2005.
doi:10.1063/1.2143137
6. Kache, S., N. S. Kranthi, M. O. Nizam, P. Kirawanich, R. W. McLaren, N. E. Islam, A. K. Sharma, C. S. Mayberry, and S. L. Lucero, "Field analysis to optimize charge collection in a sub-micron grated metal-semiconductor-metal photodetector," Progress In Electromagnetics Research, Vol. 63, 75-88, 2006.
doi:10.2528/PIER06041803
7. Kraus, J. D. and D. A. Fleisch, Electromagnetics:With Applications, 5th ed., 1999.
8. Weiland, T., "A discretization method for the solution of Maxwell's equations for six-components fields," Electrostatics and Communications, Vol. 31, 116-120, 1977.
9. User Manual, CST Microwave Studio 5.0, Sonnet Software, Inc., 2005.