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2012-06-19

Patterned Resistive Strip Loading for Edge Scattering Suppression of a Finite Wedge

By Zhi-Wei Zhu, Hai-Yan Chen, Hui-Bin Zhang, Pei-Heng Zhou, Long-Jiang Deng, and Jianliang Xie
Progress In Electromagnetics Research M, Vol. 25, 27-38, 2012
doi:10.2528/PIERM12042303

Abstract

Tapered resistive strip realized by patterning the constant resistive strip is used to suppress edge scattering of a finite wedge. The suppression effect is simulated and evaluated by the reduction in mono-static RCS (Radar Cross Section). This reduction is compared with the one which loaded by the ideal tapered resistive strip. The result indicating that patterning a constant resistive strip to create a gradient in sheet resistance is feasible. To verify this method of fabricating tapered resistive strip, patterned resistive strip with a proper gradient in sheet resistance is conducted and loaded on the wedge target for test. The gradient in sheet resistance used for test is obtained from the optimization. Resistive strip with this sheet resistance gradient renders a promising effect of edge scattering suppression. The test result shows a reduction of 20dB for the geometric mean of mono-static RCS in the angular range of 45º. This value is close to the one of 23dB in simulation.

Citation


Zhi-Wei Zhu, Hai-Yan Chen, Hui-Bin Zhang, Pei-Heng Zhou, Long-Jiang Deng, and Jianliang Xie, "Patterned Resistive Strip Loading for Edge Scattering Suppression of a Finite Wedge," Progress In Electromagnetics Research M, Vol. 25, 27-38, 2012.
doi:10.2528/PIERM12042303
http://jpier.org/PIERM/pier.php?paper=12042303

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